Radion™ Plasma Sources
Patented RADION Microwave Plasma Sources
Surface Wave Processing
A surface wave plasma tool that reduces chamber cycle times with fast, damage free processing integrated on existing equipment.
Benefits:
Works with reactive gas chemistries
Damage-free processing for nearly all materials
Save at least ½ second per PEALD half-cycle
Fast pulsed (<1msec) or steady state operation
No matching network required
Compact size
Applications:
Plasma Enhanced Atomic Layer Deposition (PEALD)
Plasma Enhanced Chemical Vapor Deposition (PECVD)
Etching, Ashing, Cleaning
Atmospheric Pressure
A hand-held atmospheric-pressure source for surface treatment and functionalization, including adhesion and bonding promotion, hydrophilic/phobic control and texturization.
Features:
Many plasma and gas mixture options
Source head diameter ranges from sub-mm to cm-scale
Atmospheric-pressure processing reduces costs
Innovative dielectric barrier jet source
Drive electronics built into handle for added safety
Variety of applications, including: medicine, electronics, printing
WATCH: RADION Slideshow
This slideshow describes the RADION atmospheric cold plasma jet using solid-state microwave applicators with direct precursor injection for plasma-enhanced chemical vapor deposition (PECVD).
This system is being used for direct plasma cleaning, surface functionalization, graded material coating for corrosion-resistance and adhesion promotion, and reactive activation and surface sealing. The RADION was successfully used for point-of-manufacturing treatment of dissimilar materials prior to adhesive bonding between Mg, Al, CFRP, stainless-steel and other composite materials.
Starfire worked with the Applied Research Institute, the Center for Plasma-Material Interactions, and General Motors LLC for this technical demonstration.
